Method for removing moisture from chlorodifluoro-methane
US5723702A · kind A · utility
4Cited by
0References
9Claims
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Key dates
| Filing date | Mar 13, 1996 |
| Grant date | Mar 3, 1998 |
| Priority date | — |
| Expiry date | Mar 13, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C17/38
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
There is a process for removing moisture from chlorodifluoromethane (CHClF.sub.2) containing moisture in excess in the preparation of chlorodifluoromethane comprising lowering the partial pressure of water in the chlorodifluoromethane gas by contacting the chlorodifluoromethane gas with an aqueous solution of calcium chloride of more than 5% by weight.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.