Electrochromic device manufacturing process
US5724175A · kind A · utility
204Cited by
6References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 2, 1997 |
| Grant date | Mar 3, 1998 |
| Priority date | — |
| Expiry date | Jan 2, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/155
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is directed to method for manufacturing electrochromic devices using laser ablation techniques. More specifically, the present invention uses laser ablation to provide a simple, noncontact method of patterning electrochromic devices to a controlled depth, to form an electrochromically active area. Furthermore, laser patterning is conducive to the formation of multiple electrochromic devices on a single substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.