Phenolic stain-resists
US5725889A · kind A · utility
4Cited by
3References
12Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 18, 1996 |
| Grant date | Mar 10, 1998 |
| Priority date | — |
| Expiry date | Sep 18, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T442/2279
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Polyamide fibrous substrates which resist staining by acid dyes, and processes for preparing the same which comprise applying, at pH 2 to 10, a base-catalyzed condensation product formed by the condensation reaction of a mixture of bis(hydroxyphenyl)sulfone and at least one other phenolic compound with formaldehyde to give a product known as a resole.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.