Patent · US Expired

Method of producing micro vacuum tube having cold emitter

US5727976A · kind A · utility

18Cited by
10References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 14, 1995
Grant dateMar 17, 1998
Priority date
Expiry dateMar 14, 2015

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J9/025
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

In a method for producing a micro vacuum tube, a dent and an etching stopper layer are formed on one surface of a mold substrate. An emitter layer is deposited on the etching stopper layer and the mold substrate is removed so that the emitter layer has a protuberance covered with the etching stopper layer. Further, a gate electrode layer is formed on the etching stopper layer and the gate electrode layer and the etching stopper layer covering a tip of the protuberance is removed. An interposed insulator layer is formed on the gate electrode layer and the tip of the protuberance and an anode electrode layer is formed on the interposed insulator layer. The interposed insulator layer between the tip of the protuberance and the anode electrode layer is removed so that a space is formed between the tip and the anode electrode layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.