Method of bonding a III-V group compound semiconductor layer on a silicon substrate
US5728623A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 16, 1995 |
| Grant date | Mar 17, 1998 |
| Priority date | — |
| Expiry date | Mar 16, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/933
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Prior to a heat treatment for bonding a III-V group compound semiconductor layer on a silicon substrate, a thermal stress relaxation layer is provided between the silicon layer and the III-V group compound semiconductor layer thermal stress relaxation layer, having a thermal expansion coefficient equal or near to the thermal expansion coefficient of the III-V group compound semiconductor layer and having a rigidity coefficient being sufficiently large to suppress generation of any crystal defects in the III-V group compound semiconductor layer due to a thermal stress generated in the heat treatment and subsequent cooling stage by the difference in the thermal expansion coefficient between the III-V group compound semiconductor layer and the silicon layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.