Ion accelerator for use in ion implanter
US5729028A · kind A · utility
Inventor
Key dates
| Filing date | Jan 27, 1997 |
| Grant date | Mar 17, 1998 |
| Priority date | — |
| Expiry date | Jan 27, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H5/06
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An ion accelerator for use in an ion beam implanter. The accelerator forms milliampere beams of heavy ions such as boron and phosphorous in a configuration in which the terminal ion source is replaced by a neutral beam injector. The neutral beam is formed at ground by the conversion of a focused beam of positive ions to neutral ions in a charge exchange canal. The neutral beam so formed is stripped of one or more electrons in a gas or vapor filled canal in the high voltage terminal. A 180.degree. analyzing magnet located in the high voltage terminal analyzes and directs a selected charge state to an acceleration tube parallel to the neutral beam injection tube where the selected positive ions are accelerated to ground potential. To extend the energy range of the accelerator below the injection energy, a high voltage insulator is provided to insulate the ground end of the positive ion acceleration tube permitting the acceleration tube and terminal to be uniformly biased at a negative voltage to decelerate the beam to very low energies at a location close to the point of use. An accelerator assembly includes a 90.degree. analyzing magnet in the high voltage terminal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.