Semiconductor wafer cleaning apparatus
US5729856A · kind A · utility
27Cited by
3References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 26, 1996 |
| Grant date | Mar 24, 1998 |
| Priority date | — |
| Expiry date | Dec 26, 2016 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA46B9/02
- WIPO fieldOther consumer goods
- WIPO sectorOther fields
Abstract
A semiconductor wafer cleaning apparatus having an edge rinse member adapted for rinsing edges of a semiconductor wafer and having a moving member adapted to permit horizontally movement of the edge rinse member, wherein the apparatus is adapted to minimize or prevent an upper surface of the wafer from being stained with pollutants during rinsing. The wafer cleaning apparatus minimizes or prevents rebounding of a rinse solution containing particles from the inside wall of a bowl during rinsing of the edges of a semiconductor wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.