Method of reducing registration error in exposure step of semiconductor device
US5731113A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 24, 1996 |
| Grant date | Mar 24, 1998 |
| Priority date | — |
| Expiry date | May 24, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of reducing a registration error is provided in which the registration error can be uniformly distributed even if an amount of displacement is larger than others at only one of a plurality of measuring points. According to the method, amounts of displacement are measured first at a plurality of measuring points, then one half the sum of the maximum value and the minimum value of the measured amounts of displacement is calculated to obtain a correction value. The correction value is fed back to an exposure apparatus as a correction value for an exposure condition setting file within the exposure apparatus used in an exposure step. The registration error can be distributed uniformly even if amounts of displacement at a plurality of measuring points are considerably different from each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.