Chemically amplified positive resist compositions
US5731126A · kind A · utility
25Cited by
8References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 3, 1996 |
| Grant date | Mar 24, 1998 |
| Priority date | — |
| Expiry date | Apr 3, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A chemically amplified positive resist composition comprising a specific polysiloxane having a terminal silanol group protected with a trimethylsilyl group, a photoacid generator and optionally a dissolution inhibitor is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.