Patent · US Expired

Resonant radiofrequency wave plasma generating apparatus with improved stage

US5736818A · kind A · utility

11Cited by
9References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 15, 1996
Grant dateApr 7, 1998
Priority date
Expiry dateMar 15, 2016

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/32834
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A plasma (56, 333) generating apparatus (10, 320, 450) wherein a stage (250, 300, 300A, 350, 400, 425) is constructed to keep the plasma on the substrate (S). A pair of electrically, non-conductive tubes (252, 252A, 303, 305, 303A, 305A 403, 405) are mounted on a conductive base plate (253,306,406) having holes (255, 306B) for gas flow and one of the tubes supports a conductive support plate (251, 301, 351, 401) for a substrate (S). An electrically conductive disk (304, 404) between the tubes is provided. An outer conductive tube (307, 418) is preferably used with larger diameter chambers. The stage is designed to prevent the plasma from falling below conductive support plate which preferably mounts a graphite insert (302, 352, 402) which supports the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.