Crystalline thin film and producing method thereof, and acoustooptic deflection element
US5741580A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 13, 1996 |
| Grant date | Apr 21, 1998 |
| Priority date | — |
| Expiry date | Aug 13, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/249921
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A thin film having a good orientation and crystallinity. A method of producing the thin film on a substrate, wherein materials of a thin film are deposited and/or crystallized on a substrate. When a laser ablation method is adopted, the temperature of the glass substrate is set in the range between 200.degree. C. and 700.degree. C., and the pressure of O.sub.2 gas in a film forming chamber is set in the range between 7.times.10.sup.-5 Torr and 1.times.10.sup.-2 Torr. A laser beam irradiates a ZnO target. The target radiates materials of a thin film, such as neutral ions, molecules and ions, and the radiated materials are deposited and/or crystallized on the glass substrate to turn into a ZnO thin film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.