Polishing method and apparatus for preferentially etching a ferrule assembly and ferrule assembly produced thereby
US5743785A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 4, 1996 |
| Grant date | Apr 28, 1998 |
| Priority date | — |
| Expiry date | Apr 4, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/3863
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The method and associated apparatus of the present invention polishes the front face of a ferrule with first and second slurries such that an end portion of each optical fiber which extends through and is held by the ferrule protrudes beyond the preferentially etched front face of the ferrule by a preselected length. In order to preferentially etch the front face of ferrule as desired, the front face of the ferrule is polished with a first slurry having a plurality of suspended particulates of a first predetermined size on average which initiates the preferential etch of the ferrule relative to the optical fibers. Thereafter, the front face of the ferrule is polished with a second slurry having a plurality of suspended particles of a second predetermined size on average. The slurries are preferably selected such that the second predetermined size is less than the first predetermined size so that the polishing of the front face of the ferrule with the second slurry completes the preferential etch of the ferrule relative to the optical fibers. By preferentially etching the front face of the ferrule relative to the optical fibers, the optical fibers will protrude beyond the front face…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.