Thermographic material with outermost antistatic layer
US5747412A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 29, 1996 |
| Grant date | May 5, 1998 |
| Priority date | — |
| Expiry date | Nov 29, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/165
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A (photo)thermographic recording material comprising a (photo-addressable) thermosensitive element, a support and an outermost antistatic layer, the thermosensitive element comprising a substantially light-insensitive organic silver salt, an organic reducing agent for the substantially light-insensitive organic silver salt in thermal working relationship therewith and a binder, characterized in that the outermost antistatic layer is an organic layer with a resistivity of <10.sup.10 .OMEGA./.quadrature. at a relative humidity of 30%. The outermost antistatic layer may comprise a polythiophene with conjugated polymer backbone in the presence of a polymeric polyanion compound and a hydrophobic organic polymer having a glass transition value (T.sub.g) of at least 40.degree. C., the polythiophene being present at a coverage of at least 0.001 g/m.sup.2 and the weight ratio of the polythiophene to the hydrophobic organic polymer being in the range of 1/10 to 1/1000. A production process for the thermographic recording material and a thermographic recording process therefor are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.