Patent · US Expired

Method for electron beam deposition of multicomponent evaporants

US5750185A · kind A · utility

2Cited by

6References

3Claims

0Family size

Assignee

Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

Klaus Goedicke · Dresden, DE
Christoph Metzner · Dresden, DE
Volker Kirchhoff · Dresden, DE
Wolfgang Hempel · Dresden, DE
Nicolas Schiller · Helmsdorf, DE

Key dates

Filing date	Apr 29, 1996
Grant date	May 12, 1998
Priority date	—
Expiry date	Apr 29, 2016

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/3132
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A method for the electron beam deposition of a multicomponent evaporant to ensure a consistent layer quality with constant composition and thickness in a defined manner. The X-radiation emitted from the evaporant on the point of electron beam impingement is measured in situ, using the obtained signal as reference input to control the parameters of the evaporation process and therefore to control the deposition rate and material composition of the deposited layer. The method is used for the production of corrosion resistant, high-temperature resistant, hard-wearing or optical layers on, for example, strip steel or plastic film.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.