Deposition of diamond on oxidizable material
US5750195A · kind A · utility
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1References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 14, 1997 |
| Grant date | May 12, 1998 |
| Priority date | — |
| Expiry date | May 14, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/277
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a process for depositing a diamond layer from an activated gaseous mixe including hydrogen and carbon where the process is facilitated by the inclusion of oxygen in the mixture and the diamond is deposited directly on a material, such as a nitride interlayer, which is oxidized by oxygen in the activated mixture, an activated mixture without oxygen is provided at the beginning of the depositing of the diamond layer and an activated mixture containing oxygen is provided when the diamond layer attains a thickness sufficient to protect the material from oxidation by the oxygen in the activated mixture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.