Ion beam processing apparatus
US5750987A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 1996 |
| Grant date | May 12, 1998 |
| Priority date | — |
| Expiry date | Apr 24, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0041
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
When neutralized plasma is generated, the cylindrical electrode 8 is set at a negative potential against the processing chamber 23 by the DC power source 18, so that ions 23 in the neutralized plasma can be collected at the cylindrical electrode 8. Electrons 24 equal to the collected ion charge can be supplied uniformly toward the ion beam 25. Therefore, by allowing the cylindrical electrode to collect ions, the ion collection area can be spread easily, and only by generating neutralized plasma of low density, a sufficient volume of ions can be collected surely from the plasma and a sufficient volume of electrons can be supplied to the ion beam 25 at the same time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.