Method of forming a plateau and a cover on the plateau in particular on a semiconductor substrate
US5753524A · kind A · utility
3Cited by
1References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 19, 1996 |
| Grant date | May 19, 1998 |
| Priority date | — |
| Expiry date | Jun 19, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/2275
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Prior to using etching to form a plateau that is to constitute a laser ridge and that is to be provided with a cover constituting a top electrode, the surface of the cover is initially protected with a dielectric mask and the flanks of the cover are then protected with a dielectric coating. The dielectric coating is initially deposited uniformly over the surface and the flanks. It is then etched by directional means so that it remains on the flanks only. The invention is particularly applicable to making an optical amplifier.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.