Semiconductor laser device
US5757835A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 3, 1997 |
| Grant date | May 26, 1998 |
| Priority date | — |
| Expiry date | Jan 3, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/34326
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A semiconductor laser device includes a structure in which a first conductivity AlGaInP first cladding layer, an active layer, a second conductivity type AlGaInP second cladding layer, a second conductivity type AlGaInP intermediate layer, and a second conductivity type AlGaInP third cladding layer are successively epitaxially grown on a first conductivity type GaAs semiconductor substrate. The intermediate layer is within a profile of light produced in the active layer and includes AlGaInP layers having a band gap energy smaller than the band gap energy of the second cladding layer and the third cladding layer and larger than the band gap energy of the active layer. The intermediate layer has a multi-layer structure in which (Al.sub.x Ga.sub.1-x)InP layers (0.ltoreq.x.ltoreq.0.2) and (Al.sub.x Ga.sub.1-x)InP layers (0.5.ltoreq.x.ltoreq.1) are alternatingly laminated. By adding a small amount of Al to the intermediate layer, the band gap energy of the intermediate layer is broadened to control absorption of light emitted from the active layer and an increase in the threshold current of laser oscillation is suppressed. Since the intermediate layer has a multi-layer structure, a semi…
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