Photoresist removing apparatus
US5759335A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 26, 1996 |
| Grant date | Jun 2, 1998 |
| Priority date | — |
| Expiry date | Dec 26, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6708
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for removing a photoresist from the edge of a semiconductor wafer includes a nozzle for finely spraying a liquid for removing a photoresist. The horizontal position of the nozzle is controlled by a horizontal fixture having a screw groove formed therein. A guide rail has a channel into which the horizontal fixture is slidably inserted. A scale marked on a peripheral surface of the guide rail verifies the position of a reference mark on the horizontal fixture. A fine adjustment screw is inserted into the screw groove of the horizontal fixture to a variable depth for adjusting the horizontal position of the horizontal fixture. A shaft is connected to the guide rail, with the shaft having a top portion functioning as a piston, for adjusting the vertical position of the nozzle by fixing the guide rail to the shaft and moving the resulting combination up and down. The top portion of the shaft is movable within a cylinder. The fine horizontal and vertical adjustment of the nozzle allows adequate removal of the photoresist from the edge of the wafer, increasing the yield of the semiconductor devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.