Radiation-sensitive mixture

US5759750A · kind A · utility

Assignee

• BASF SE

Inventors

• Horst Binder · Lampertheim, DE
• Reinhold Schwalm · Monsheim, DE
• Dirk Funhoff · Heidelberg, DE

Key dates

• Filing date: Apr 18, 1997
• Grant date: Jun 2, 1998
• Expiry date: Apr 18, 2017

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/122
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A radiation-sensitive mixture essentially consisting of PA1 (a) a water-insoluble binder or binder mixture and PA1 (b) a compound which forms a strong acid on exposure to radiation, component (a) being a phenolic resin in which some or all of the phenolic hydroxyl groups have been replaced with groups (IA) or (IB) ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are each alkyl or R.sup.1 together with R.sup.2 forms a ring and X is CH.sub.2, O, S, SO.sub.2 or NR.sup.4, is suitable for the production of relief structures.