Electron beam apparatus and image forming apparatus
US5760538A · kind A · utility
72Cited by
6References
50Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 19, 1997 |
| Grant date | Jun 2, 1998 |
| Priority date | — |
| Expiry date | Aug 19, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2329/8655
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam apparatus includes an electron source having an electron-emitting device, an electrode for controlling an electron beam emitted from the electron source, a target to be irradiated with an electron beam emitted from the electron source and a spacer arranged between the electron source and the electrode. The spacer has a semiconductor film on the surface thereof that is electrically connected to the electron source and the electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.