Cleaning agents and cleaning method
US5763375A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 24, 1996 |
| Grant date | Jun 9, 1998 |
| Priority date | — |
| Expiry date | Jul 24, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A cleaning agent characterized in that the agent comprises 0.1 to 4 wt. % of hydrofluoric acid, a surfactant of the following formula (1) in a concentration of 50 to 1500 ppm or a surfactant of the following formula (2) or (3) in a concentration of 50 to 100000 ppm, and the balance water, and a cleaning method of the surfaces of silicon wafers and the like using the agent EQU RfCOONH.sub.4 (1) wherein Rf is a fluorine-containing hydrocarbon group having 5 to 9 carbon atoms EQU Rf'O(CH.sub.2 CH.sub.2 O)nR (2) EQU Rf'(CH.sub.2 CH.sub.2 O)nR (3) wherein Rf' is a fluorine-containing hydrocarbon group having 5 to 15 carbon atoms, R is hydrogen or alkyl having 1 to 4 carbon atoms, and n is 5 to 20.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.