Cleanser composition comprising an alkali metal salt of a secondary Amide-type N-Acylamino acid , and alkali metal salt of a higher fatty acid , and an amphoteric surfactant
US5767059A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 27, 1996 |
| Grant date | Jun 16, 1998 |
| Priority date | — |
| Expiry date | Aug 27, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D1/92
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
The present invention provides a cleanser composition which is free from any thickener, contains surfactant(s) at such a concentration as not to irritate the skin or mucosa, can impart an appropriate consistency to the cleanser, exhibits excellent foaming, can be easily taken out from a container in use and gives a good feel in use. The cleanser composition comprises the following components (A), (B) and (C): (A) an alkali metal salt of a secondary amide-type N-acylamino acid represented by formula (1): EQU R.sup.1 CONH(CH.sub.2).sub.n COOH (1) wherein R.sup.1 CO represents a linear acyl group having 10 to 16 carbon atoms; and n is a number of 1 or 2; (B) an alkali metal salt of a higher fatty acid; and (C) an amphoteric surfactant; and the mixing ratio by weight of (A+B)/C ranges from 2.5/1 to 1/2.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.