Patent · US Expired

High producing rate of nano particles by laser liquid interaction

US5770126A · kind A · utility

52Cited by
2References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 5, 1996
Grant dateJun 23, 1998
Priority date
Expiry dateSep 5, 2016

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2004/64
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

The present invention is a process and apparatus for producing nano-scale particles using the interaction between a laser beam and a liquid precursor solution. There are two embodiments. The first embodiment includes the use of a solid substrate during the laser-liquid interaction. In this embodiment the laser beam is directed at the solid substrate which is immersed in the liquid precursor solution and rotating. The second embodiment includes the use of a plasma during the laser-liquid interaction. In the second embodiment, a mixture of a liquid precursor and a carrier gas is injected into a laser beam. Injection of the mixture can be performed either perpendicular or parallel to the laser beam. The apparatus for injecting the liquid precursor and carrier gas into the laser beam includes a plasma nozzle designed to allow the laser beam to enter the plasma nozzle so that the laser beam may irradiate what is flowing through the plasma nozzle to create a plasma flow. The carrier gas allows for the formation of a plasma by its interaction with the laser beam. The liquid precursor is allowed to atomize into fine droplets. These fine droplets are exposed to the laser beam along with the…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.