Method of forming recordable optical element using low absorption materials
US5770293A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 12, 1996 |
| Grant date | Jun 23, 1998 |
| Priority date | — |
| Expiry date | Apr 12, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/21
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of forming a recordable element including a substrate and having on its surface, in order, an optical recording layer and a light reflecting layer, the optical recording layer having at least two sublayers of different compositions is disclosed. The method includes forming in a sputtering chamber on the substrate surface a first sublayer of a predetermined thickness by sputtering at least two metal elements having Ge and Te, or alloys thereof, in a flowing environment of a hydrocarbon gas and an inert gas wherein the flow rate of the hydrocarbon gas is selected relative to the flow rate of the inert gas to provide the first sublayer with an elemental R.sub.min reflectivity is in the range of 40-60% and forming in the sputtering chamber on the first sublayer a second sublayer of a predetermined thickness by sputtering at least two elements having Ge and Te, or alloys thereof, in a flowing environment of hydrocarbon gas and the inert gas, with the flow rates of the hydrocarbon gas and the inert gas being substantially the same as when the first sublayer was formed and reducing the sputtering rate of the metal elements in comparison to that used when forming the first sublaye…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.