Photolabile polymers with triazenedor/and pentazadiene building blocks

US5770685A · kind A · utility

Assignee

• Boehringer Mannheim GmbH · DE

Inventors

• Jurgen Stebani · Krefeld, DE
• Oskar Nuyken · Munich, DE
• Peter Sluka · Weilheim, DE
• Peter Finckh · Breitbrunn, DE

Key dates

• Filing date: Feb 26, 1996
• Grant date: Jun 23, 1998
• Expiry date: Feb 26, 2016

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C09D179/00
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

The invention concerns the use of triazene or/and pentazadiene polymers as photoresists and in particular as positive photoresists in order to cover biochemical reagents. In addition the invention concerns a new process for the production of triazene or/and pentazadiene polymers.