Optical test system including interferometer with micromirror and piezoelectric translator for controlling test path mirror
US5771095A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 20, 1996 |
| Grant date | Jun 23, 1998 |
| Priority date | — |
| Expiry date | Sep 20, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J9/02
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical system for determining aberration in a source beam by comparison of a test beam with a reference beam. The optical system includes a test source for producing a source beam having a spacial intensity distribution including an aberration component, a wavefront analyzer for processing a fringe signal associated with the aberration component, and an interferometer. The interferometer is provided with a beamsplitter for splitting the source beam into a test beam and a reference beam, an imaging device for detecting the test beam and the reference beam, and a mirror disposed in a test beam path for reflecting the test beam toward the imaging device. The interferometer also includes a micromirror disposed in a reference beam path for reflecting a portion of the reference beam toward the imaging device and a piezoelectric translator operatively linked to the mirror and controlled by the wave front analyzer. The mirror is capable of moving relative to the path of the test beam. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam as focused thereon by focusing means so that when the test beam is reflected…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.