Laser interferometric lithographic system providing automatic change of fringe spacing
US5771098A · kind A · utility
21Cited by
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3Claims
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Key dates
| Filing date | Sep 27, 1996 |
| Grant date | Jun 23, 1998 |
| Priority date | — |
| Expiry date | Sep 27, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/001
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An interferometric lithographic apparatus includes an arrangement for applying interfering laser beams to a part for producing a first interference pattern. The first interference pattern has a first fringe spacing. A mobile part holder stage is repositioned to change the interference pattern and produce a second fringe spacing. A control arrangement, automatically responsive to the repositioning of the part holder, re-aligns optical paths and optimally interferes the laser beams to produce the second fringe spacing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.