Near real-time extraction of deposition and pre-deposition characteristics from rotating substrates and control of a deposition apparatus in near real-time
US5772758A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 15, 1996 |
| Grant date | Jun 30, 1998 |
| Priority date | — |
| Expiry date | Feb 15, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/1008
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods and apparatus are provided for monitoring deposition and pre-deposition characteristics such as the growth rates, oxide desorption, surface reconstruction, anion surface exchange reaction and smoothness of the surface of rotating substrates in near real-time during molecular beam epitaxy by processing the data in the time domain and for controlling a deposition apparatus in near real-time. An apparatus for extracting the characteristics and controlling the deposition apparatus in near real-time includes the following: (a) the deposition apparatus having a rotating substrate, (b) an energy pattern generator for subjecting the substrate to a beam of energy and for producing energy patterns, (c) an imaging unit for obtaining video images of the energy patterns, video images each having pixels, (d) a data processing unit for monitoring a selected set of the pixels on each of the video images, generating time-domain data for each video image and generating deposition parameters in near real-time, and (e) a deposition control unit for controlling the deposition apparatus in response to receiving the deposition parameters in near real-time. The method of extracting the characteris…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.