Patent · US Expired

Process for producing a patterned anisotropic polymeric film

US5773178A · kind A · utility

16Cited by
0References
8Claims
0Family size

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Key dates

Filing dateSep 13, 1996
Grant dateJun 30, 1998
Priority date
Expiry dateSep 13, 2016

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02F1/133788
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A process for producing a patterned anisotropic polymeric film using an ac field and photopolymerizable liquid crystalline monomers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.