Process for recovering semiconductor industry cleaning compounds
US5779763A · kind A · utility
33Cited by
20References
71Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 7, 1997 |
| Grant date | Jul 14, 1998 |
| Priority date | — |
| Expiry date | Mar 7, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02C20/30
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A process for separating perfluoro compound gas or vapor from another gas, typically nitrogen, in a gas mixture. The process involves a combination of membrane separation and condensation, and is particularly useful in the semiconductor industry, for treating exhaust gases from cleaning of chemical vapor deposition chambers. Operation of the condensation step at temperatures no lower than about -30.degree. C. reduces the need for refrigeration equipment and controls the amount of gas dissolved in the recovered perfluoro compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.