System for removing a coating from a substrate
US5782253A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Mar 2, 1994 |
| Grant date | Jul 21, 1998 |
| Priority date | — |
| Expiry date | Mar 2, 2014 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB44D3/166
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A system is provided for removing material from a structure having at least one layer of the material formed on a substrate. The system includes a radiant energy source, such as a flashlamp, with an actively cooled reflector for irradiating a target area of a structure with radiant energy, preferably sufficiently intense in at least the visible and ultraviolet, to break or weaken chemical bonds in the material, and an abrasive blaster for impinging the material after irradiation with a cool particle stream, preferably including of CO.sub.2 particles, to remove the irradiated material and cool the substrate. The system may also include light sensors used in a feedback loop to control the removal process by varying the speed at which the radiant energy source is moved along the structure, the repetition rate of the source, the intensity of the source, the pulse width of the source and/or the distance between the source and the structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.