Patent · US Expired

Method and apparatus for automatically and simultaneously determining best focus and orientation of objects to be measured by broad-band interferometric means

US5784164A · kind A · utility

47Cited by
17References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 20, 1997
Grant dateJul 21, 1998
Priority date
Expiry dateMar 20, 2017

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01B11/2441
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method and improved system for automatically and substantially simultaneously focusing and orienting an interferometric optical system, such as an interferometric microscope (25) illuminated by broad-band light, with regard to a surface under test (66), for providing a best focus and orientation of objects to be measured. The optical system (20, 25, 30, 35, 37, 60, 40) includes a pixel array, such as a sparse array (30) onto which an interferogram is imaged. The pixel array (30) is scanned (20, 25) for detecting a peak fringe contrast for the pixels in the array (30) and the scan position at the detected peak fringe contrast for each pixel int he array (30) is saved (40). At least a portion, if not all, of the saved scan positions are fitted to a surface shape for providing a plane of best focus for the surface under test (66), and the surface under test (66) is automatically positioned (40, 35, 60) relative to the optical system for automatically focusing the object under test (66) across the plane of best focus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.