Method and apparatus for automatically and simultaneously determining best focus and orientation of objects to be measured by broad-band interferometric means
US5784164A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 20, 1997 |
| Grant date | Jul 21, 1998 |
| Priority date | — |
| Expiry date | Mar 20, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/2441
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and improved system for automatically and substantially simultaneously focusing and orienting an interferometric optical system, such as an interferometric microscope (25) illuminated by broad-band light, with regard to a surface under test (66), for providing a best focus and orientation of objects to be measured. The optical system (20, 25, 30, 35, 37, 60, 40) includes a pixel array, such as a sparse array (30) onto which an interferogram is imaged. The pixel array (30) is scanned (20, 25) for detecting a peak fringe contrast for the pixels in the array (30) and the scan position at the detected peak fringe contrast for each pixel int he array (30) is saved (40). At least a portion, if not all, of the saved scan positions are fitted to a surface shape for providing a plane of best focus for the surface under test (66), and the surface under test (66) is automatically positioned (40, 35, 60) relative to the optical system for automatically focusing the object under test (66) across the plane of best focus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.