Process and plant for treatment of a gas mixture including ozone
US5785738A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 27, 1995 |
| Grant date | Jul 28, 1998 |
| Priority date | — |
| Expiry date | Dec 27, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02C20/40
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A process for treatment of a secondary gas including ozone, comprising the steps of: a) adding an adjacent gas including CO.sub.2 to the secondary gas to form a mixture of secondary gas and adjacent gas; b) passing the mixture of secondary gas and of adjacent gas obtained at the end of stage a) into at least one stock of adsorbent, where the ozone is completely or partly adsorbed; c) sweeping the stock of adsorbent with the aid of a desorbing gas including CO.sub.2, and discharging from an outlet of the stock an output gas including ozone, wherein the ozone has a concentration which is higher in the output gas than the ozone concentration of the secondary gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.