Method for designing a reticle mask
US5789120A · kind A · utility
9Cited by
1References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 3, 1997 |
| Grant date | Aug 4, 1998 |
| Priority date | — |
| Expiry date | Jun 3, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/50
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for designing a reticle mask with a reduced pattern by use of another larger reticle mask having a circuit pattern and scribe line patterns on lower and right edges of the circuit pattern. In the method, the larger circuit pattern is modified by forming two dummy scribe line regions at upper and left edges of the larger circuit pattern. The modified mask pattern is then reduced. The reduced mask pattern is repeatedly copied on a reticle frame region, with at least one of the dummy scribe line regions overlapping at least one of the scribe line regions of an adjacent reduced mask pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.