Patent · US Expired

Microelectronic component fabrication facility, and process for making and using the facility

US5795356A · kind A · utility

42Cited by
13References
23Claims
0Family size

Assignee

Inventor

Key dates

Filing dateMay 31, 1996
Grant dateAug 18, 1998
Priority date
Expiry dateMay 31, 2016

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S438/908
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A process for manufacturing microelectronic components that can be fabricated in a facility 1 including integrated circuits on silicon wafers, flat panel displays on glass substrates or any other microelectronic components fabricated in a similar fashion, a process of constructing the facility, and the facility. The fabrication facility 1 relies on a central hub 3 from which processing areas 2 extend out radially like spokes. The processing areas 2 are arranged in a pattern so as to be served by common services which include gases, chemicals, ultra pure water, vapor exhaust, liquid waste, air conditioning, centralized vacuum, centralized clean compressed air, hot water, steam, natural gas, power including emergency, conditioned, and unconditioned power, and process cooling water.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.