Systems and method for establishing positional accuracy in two dimensions based on a sensor scan in one dimension
US5796414A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 25, 1996 |
| Grant date | Aug 18, 1998 |
| Priority date | — |
| Expiry date | Mar 25, 2016 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41J19/142
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
The invention is a system for determining positional deviation of at least one automatic marking implement from a nominal position, and an apparatus and method for establishing positional accuracy of such an implement. Calibration patterns including diagonal indicia are formed along only one dimension of a printing medium by the implement, or implements. Preferably a sensor automatically scans the diagonal pattern along one dimension, ideally the same dimension--without operating in a second, orthogonal direction. Nevertheless scanning of the diagonal indicia enables development of composite information about deviations in both directions. There is no necessity of either forming or sensing any pattern that is extended (by more than one marking-implement swath) in two different directions. The composite information is combined with information about deviations along the same scanning direction exclusively, to extract in isolated form the deviation information for the second, orthogonal direction. The invention is particularly useful in determining deviations from nominal offsets between plural marking implements, such as thermal-inkjet pens holding ink of different colors in a compu…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.