Method of processing a light-sensitive silver halide material
US5800969A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 5, 1997 |
| Grant date | Sep 1, 1998 |
| Priority date | — |
| Expiry date | May 5, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C2200/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method is disclosed of processing an image-wise exposed light-sensitive silver halide material by the steps of developing, fixing in a fixer solution containing less than 4 g per liter of aluminum ions expressed as an equivalent amount of aluminum sulphate, rinsing and drying; characterised in that said material comprises a support and on one or both sides thereof at least one light-sensitive silver halide emulsion layer and a gelatinous protective antistress layer, wherein said antistress layer comprises at least one polymer latex in such an amount that there is a ratio by weight of latex to gelatin is from 0.5 to 1.5 and wherein said material is hardened to such an extent that its swelling degree after immersing said material for 3 minutes in demineralised water of 25.degree. C. is not more than 300%.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.