Apparatus for coating substrates in a vacuum
US5807470A · kind A · utility
21Cited by
10References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 1, 1996 |
| Grant date | Sep 15, 1998 |
| Priority date | — |
| Expiry date | Aug 1, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An alternating-current source (2) is connected to two cathodes (6,7) which cooperate electrically with targets which are sputtered in a gas discharge while a process gas is introduced in a vacuum chamber (15). A network formed of a transformer (3) and additional coils (5, 12, 13) and condensers (4, 8, 9, 10, 11) acts as a filter to assure a stable coating process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.