Method for marking substrates
US5808268A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 23, 1996 |
| Grant date | Sep 15, 1998 |
| Priority date | — |
| Expiry date | Jul 23, 2016 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41M5/26
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A method for marking a surface with high-density indicia comprising the steps of providing a marking device, providing input data defining indicia to be marked on the surface wherein the indicia comprises characters and the input data further defines a font for each character of the indicia, determining pixels for each character in accordance with the font, forming raster lines in accordance with the pixels, and traversing each raster line with the marking device to mark the surface according to the pixels of the raster line. If a laser is used as the marking device, the laser may need time to recharge in between marking closely spaced pixels. Thus, the laser may pass over certain pixels while the laser is recharging. Therefore, the laser may have to make an additional pass over the raster line to mark the pixels that were skipped over while the laser was recharging.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.