Sputtering system using cylindrical rotating magnetron electrically powered using alternating current
US5814195A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 25, 1996 |
| Grant date | Sep 29, 1998 |
| Priority date | — |
| Expiry date | Oct 25, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3405
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A sputtering system using an AC power supply in the range of 10 kHz to 100 kHz uses two rotatable cylindrical magnetrons. The rotatable cylindrical magnetrons, when used for depositing a dielectric layer onto a substrate, clean off dielectric material that is deposited onto the target. This prevents a dielectric layer on the target from acting like a capacitor and may help avoid arcing. Additionally, an impedance-limiting capacitor can be placed in series in the electrical path between the targets through the transformer so as to reduce arcing. This impedance-limiting capacitor has a value much larger than the capacitors used to couple the power supply to a target in radio frequency sputtering systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.