Transmission mask for charged particle beam exposure apparatuses, and an exposure apparatus using such a transmission mask
US5814423A · kind A · utility
40Cited by
2References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 30, 1996 |
| Grant date | Sep 29, 1998 |
| Priority date | — |
| Expiry date | Oct 30, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0435
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A transmission mask for a charged particle beam exposure apparatus that includes a mask substrate having a plurality of apertures arrange in a matrix and a pair of deflection electrodes at each aperture on one surface of the mask substrate. A beam shield layer having a reflectivity to the charged particle beam greater than the mask substrate is positioned on the other surface of the mask substrate. The transmission mask is installed in the apparatus so that the beam shield layer is oriented towards the charged particle beam to prevent an increase in temperature due to irradiation of the charged particle beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.