Vapor drying system and method
US5815942A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Dec 13, 1996 |
| Grant date | Oct 6, 1998 |
| Priority date | — |
| Expiry date | Dec 13, 2016 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF26B21/145
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A vapor drying system includes a tank for holding a drying liquid and a heater for boiling the drying liquid in the tank to produce a vapor. A manifold is arranged in the tank for bubbling gas into the drying liquid. A controller is configured to cause the manifold to bubble gas into the drying liquid at a time when substrates to be dried are first introduced into the tank in order to quench the boiling of the drying liquid and generate a saturated vapor at a rate sufficient to achieve condensation of the drying liquid over substantially the entire surface of each of the substrates to be dried. In this way, staining of the substrates is reduced and process yield is improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.