Method and apparatus for maintaining sensitive articles in a contaminant-free environment
US5815947A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 20, 1997 |
| Grant date | Oct 6, 1998 |
| Priority date | — |
| Expiry date | Feb 20, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/14
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Sensitive articles, such as IC wafers can be maintained in a contamination-free condition. A base member is provided for supporting one or more of the sensitive articles. A cover is provided for sealing engagement with a base member so as form a sealed unit. The sealed unit has an interior. The sealed unit is positioned at a storage position. A particle-free ionized gas is passed though the interior to bathe the articles supported therein with the gas at the storage position. The sealed unit is moved with the articles to an access position on associated processing equipment. The cover is removed from the base to expose the articles. The exposed articles are bathed continuously at the access position with a particle-free ionized gas. The articles are moved sequentially between the access position and a processing position on the associated processing equipment. The articles are bathed with a particle-free ionized gas during the moving steps. The cover is replaced on the base member so as to form the sealed unit and the sealed unit is returned with a processed wafer to the storage position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.