Gas reactor using a plasma for cracking or synthesizing gases
US5817218A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 30, 1996 |
| Grant date | Oct 6, 1998 |
| Priority date | — |
| Expiry date | Aug 30, 2016 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2219/0894
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The gas reactor 10 has a first gas inlet 32, a second gas inlet 34, a gas outlet 36, a rotatable plate 22 and stationary plate 20 opposed to this rotatable plate, wherein a gap 24 is formed between these plates. Catalysts 26, 28 are carried by these rotatable and stationary plates. The rotatable and stationary plates are connected to a power supply so that plasma 30 can be generated in the gap 24. In the gap 24, a chemical reaction is promoted by the catalyst and plasma, and further a turbulent gas flow is made by the action of the rotatable plate, so that the chemical reaction can be facilitated. In this way, the first gas passes through the first gas inlet 32 and flows into the gap 24, and the first gas is activated in the gap. The second gas is fed from the second inlet 34 onto the downstream side of the gap 24 and mixed and reacted with the activated first gas. In the gas reactor, it is possible to use a fan instead of the rotatable plate, that is, it is possible to adopt a fan type gas reactor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.