Method for decomposing halide-containing gas
US5817284A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 29, 1996 |
| Grant date | Oct 6, 1998 |
| Priority date | — |
| Expiry date | Oct 29, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02C20/30
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention relates to a method for decomposing any of chlorocarbons, chlorofluorocarbons, perfluorocarbons and SF.sub.6 contained in a gas. This method includes the step of bringing the gas into contact, at a temperature of at least 300.degree. C., with a first mixture consisting essentially of 0.05-40 wt % of potassium hydroxide and at least one compound selected from the group consisting of alkali-earth-metal oxides and alkali-earth-metal hydroxides, for decomposing the at least one halide compound. When the halide compound-containing gas further contains oxygen, this gas may be brought into contact, at a temperature of at least 500.degree. C., with at least one first substance selected from the group consisting of active carbon, iron powder and nickel powder, for removing the oxygen from the gas, prior to the halide compound decomposition. When the halide compound-containing gas still further contains a strong oxidizing gas (e.g., fluorine), this gas may be brought into contact, at a temperature of at least 300.degree. C., with at least one second substance selected from the group consisting of Si, Ti, Ge, W, Mo, Fe, Mn, Co, Zn, Sn, B, Zr and compounds of these elemen…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.