Optical apparatus having a highly diffusive metal surface layer
US5817422A · kind A · utility
5Cited by
1References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 5, 1997 |
| Grant date | Oct 6, 1998 |
| Priority date | — |
| Expiry date | Feb 5, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31678
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method is disclosed for the production of highly diffusive or absorptive metal surfaces. A dendritic crystal structure surface layer of metal is electrodeposited on a substrate, using a bipolar pulse plating technique. This metal surface layer may then be oxidized to provide a highly anti-reflective surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.