Solid source MOCVD system
US5820678A · kind A · utility
34Cited by
3References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 30, 1997 |
| Grant date | Oct 13, 1998 |
| Priority date | — |
| Expiry date | May 30, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4481
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A system for MOCVD fabrication of superconducting and non-superconducting oxide films provides a delivery system for the feeding of metalorganic precursors for multi-component chemical vapor deposition. The delivery system can include multiple cartridges containing tightly packed precursor materials. The contents of each cartridge can be ground at a desired rate and fed together with precursor materials from other cartridges to a vaporization zone and then to a reaction zone within a deposition chamber for thin film deposition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.