Patent · US Expired

Photolithographic production of microprotrusions for use as a space separator in an electrical storage device

US5821033A · kind A · utility

43Cited by
32References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 25, 1994
Grant dateOct 13, 1998
Priority date
Expiry dateNov 25, 2014

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02T10/70
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

The present invention relates to a photolithographic method to produce multiple, electrically insulating microprotrusions on an electrically conducting substrate to produce and maintain substantially uniform space separation between the substrates which act as electrodes in a double layer capacitor or battery configuration. Preferably, the electrically insulating microprotrusions are an organic photocurable epoxide polymer, a photocurable acrylic polymer or combinations thereof.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.