Generation of electrolytically active water and wet process of a semiconductor substrate
US5824200A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 8, 1997 |
| Grant date | Oct 20, 1998 |
| Priority date | — |
| Expiry date | Apr 8, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/00
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
There is provided a method of, and an apparatus for obtaining electrolytically activated water having stable characteristics comprising steps of bringing a gas containing at least one of chlorine, hydrogen chloride, hydrogen bromide and hydrogen iodide into contact with a liquid in an anode cell of an electrolytic cell or a liquid supplied thereto and/or bringing ammonia into contact with a liquid in a cathode cell of the electrolytic cell, or a liquid supplied thereto to dissolve the gas to thereby electrolyze this liquid. The resulting electrolytically activated water is optimal as the wet treating solution adapted for semiconductor substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.